Park Systems, Schaefer Romania and Ruđer Bošković Institute are pleased to invite you to a workshop on Advances and Accuracy in Atomic Force Microscopy: Nanocharacterization for Materials Science, which will take place in October, 2020 at Ruđer Bošković Institute.

We will demonstrate advances in nanocharacterization techniques on the Park NX10 AFM during a live demo session.

Date: October, Week 12-16

Place: Ruđer Bošković Institute, Zagreb, Croatia

This workshop is open to everyone and is free of charge.

This is a 1-day Workshop. The exact date will be specified at the beginning of September 2020.

Magnetic Force Microscopy (MFM) is an Atomic Force Microscopy (AFM) method used for investigating and mapping magnetic properties of surfaces. It is the ideal technique to image the spatial distribution of magnetic states in a sample. In vacuum, MFM offers improved sensitivity and thus allows for high-resolution magnetic domain imaging.

In various fields of study from material research to biological sciences, MFM is an important tool for detecting nanoscale magnetic domains by measuring the interaction force between a magnetic tip and sample.

• Date: Thursday, October, 1

• Place: Amphitheatre Room, Laboratoire de Physique des Solides • UMR 8502-Campus universitaire-Bât.510 • F-91405 Orsay Cedex

• Time: 9:30-17:30

In this workshop you will learn about the latest advances in magnetic force microscopy, such as

• the newly developed coupled out-of-plane and in-plane magnetic field generator with variable field strengths allowing for maximum flexibility and customized MFM experiments

• advantages of MFM when measuring in vacuum

The workshop is FREE OF CHARGE and open to all interested scientist.

Lunch and workshop dinner are included.

Registrer here.

This focused workshop series will provide an opportunity to Design, Process, Metrology, Yield and Failure Analysis Engineers to interface directly with Park Systems’ advanced applications experts and discuss day-to-day nanoscale solutions that address device manufacturing challenges.

Nanoscale Solutions for Design and Manufacturing of Electronic Devices – a digital workshop series

Register for the first workshop , held on June 25th

WHY PARK SYSTEMS ATOMIC FORCE MICROSCOPES

• • Leader in Automated AFM Equipment
• • Industry's sole non-destructive inspection and metrology technology, bundled in a single instrument
• • Lower in-fab costs compared to individual inspection or metrology tools
• • Fully-automated fleet matching tools enable day-to-day solutions for manufacturing yield challenges
• • The choice of many of the top 20 Semiconductor Manufacturers

WHY PARK SYSTEMS ATOMIC FORCE MICROSCOPES

• • Device Scaling and Novel Structure Designs
• • Process Advancements to Enable High Volume Manufacturing Solutions
• • Inspection and Metrology Methods to Capture Yield Excursion
• • Packaging and Reliability Considerations.

THE LATE-NIGHT AFM WORKSHOP

Advances in Materials Nanocharacterization and Material Analysis: Exploring the Potential of the Sideband KPFM Mode

Date: 16 March, 2020

Time: 21:00 p.m.

Place: Le forum des microscopies à sonde locale

We will showcase the capabilities of the Park NX20 AFM, the leading large sample Atomic Force Microscope (AFM) with the wide range of nanomechanical, magnetic and electrical material characterization modes with a focus on a new generation KPFM mode!

The LATE-NIGHT AFM Workshop is open to everyone and is FREE of charge.

The 34th edition of The Surface & Interface Days (JSI 2020) will take place on 22 to 24 January 2020 at the Pierre and Marie Curie campus of Sorbonne University, France.

Park Systems France is honored to contribute to the event with a booth and practical hands-on-sessions on Park NX20 large sample AFM!

Get hands on the newest generation of Atomic Force Microscopy (AFM) and sign up for a hands-on-session slot on Park Systems NX20 large sample AFM. Learn about the latest updates in materials’ nanocharacterization with wide range of nanomechanical, magnetic and electrical measuring modes, such as Scanning Spreading Resistance Microscopy SSRM, conductive AFM (C-AFM) and Scanning Capacitance Microscopy (SCM).