PiFM: e-Beam Damage on ArF Photo Resist
In the PiFM spectrum, distinctive peaks were observed at 1730 cm⁻¹ and 1790 cm⁻¹. These peaks are related to lactone (cyclic carboxylic esters) and the etching rate of the photoresist for ArF laser lithography. The image on the right shows the results based on the PiFM spectrum, where the wavelengths at 1730 cm⁻¹ and 1790 cm⁻¹ were strategically chosen for the analysis.
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